Publication Information

Title:
Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
Type:
Journal
Info:
J. Phys. Chem. C, 2020, 124 (22), pp 11990-12000
Date:
2020-05-12

Author Information

Name Institution
Ji LiuTyndall National Institute, University College Cork
Hong Liang LuFudan University
David Wei ZhangFudan University
M. G. NolanTyndall National Institute, University College Cork

Films

Plasma Co


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: -

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: -

Substrates

Co

Keywords

Reaction Mechanism

Notes

1506