2022 Year in Review

August 2023 Stats


The publication database currently has 1695 entries.
210 Films
283 Precursors
78 Dep Hardware Sets
255 Characteristics
96 Theses
5204 Authors

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2021 Year in Review
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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films Gallium nitride thin films by microwave plasma-assisted ALD Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium

Hong Liang Lu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hong Liang Lu returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
2Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
3Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
4Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
5Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
6Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
7Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition

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