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The publication database currently has 1659 entries.
204 Films
274 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5095 Authors

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Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy

Hong Liang Lu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hong Liang Lu returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
2Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
3Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
4Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
5Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
6Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice

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