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Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
Type:
Journal
Info:
Nanomaterials 2019, 9, 55
Date:
2018-12-27
Author Information
| Name | Institution |
|---|---|
| Hong-Ping Ma | Fudan University |
| Jia-He Yang | Fudan University |
| Jian-Guo Yang | Fudan University |
| Li-Yuan Zhu | Fudan University |
| Wei Huang | Fudan University |
| Guang-Jie Yuan | Shanghai University |
| Ji-Jun Feng | University of Shanghai for Science and Technology |
| Tien-Chien Jen | University of Johannesburg |
| Hong Liang Lu | Fudan University |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Microstructure
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Optical Properties
Analysis: Ellipsometry
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Substrates
| Si(100) |
Notes
| 1542 |