Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
Type:
Journal
Info:
Nanomaterials 2019, 9, 55
Date:
2018-12-27
Author Information
Name | Institution |
---|---|
Hong-Ping Ma | Fudan University |
Jia-He Yang | Fudan University |
Jian-Guo Yang | Fudan University |
Li-Yuan Zhu | Fudan University |
Wei Huang | Fudan University |
Guang-Jie Yuan | Shanghai University |
Ji-Jun Feng | University of Shanghai for Science and Technology |
Tien-Chien Jen | University of Johannesburg |
Hong Liang Lu | Fudan University |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Microstructure
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Optical Properties
Analysis: Ellipsometry
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Substrates
Si(100) |
Notes
1542 |