Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice

Type:
Journal
Info:
Nanomaterials 2019, 9, 55
Date:
2018-12-27

Author Information

Name Institution
Hong-Ping MaFudan University
Jia-He YangFudan University
Jian-Guo YangFudan University
Li-Yuan ZhuFudan University
Wei HuangFudan University
Guang-Jie YuanShanghai University
Ji-Jun FengUniversity of Shanghai for Science and Technology
Tien-Chien JenUniversity of Johannesburg
Hong Liang LuFudan University

Films

Plasma SiO2


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Microstructure
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

Si(100)

Notes

1542