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The publication database currently has 1658 entries.
204 Films
274 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5093 Authors

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Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy Innovative remote plasma source for atomic layer deposition for GaN devices

Wei Huang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wei Huang returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
2Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
3Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
4Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
5Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice

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