Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
Type:
Journal
Info:
Material Science Forum, vol. 815, pp. 8-13, 2015
Date:
2015-03-20
Author Information
| Name | Institution |
|---|---|
| Chun Min Zhang | Fudan University |
| Xiao Yong Liu | Fudan University |
| Lin Qing Zhang | Fudan University |
| Hong Liang Lu | Fudan University |
| Peng Fei Wang | Fudan University |
| David Wei Zhang | Fudan University |
Films
Plasma RuO2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Substrates
| TiN |
Notes
| 528 |