Publication Information

Title:
Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
Type:
Journal
Info:
Material Science Forum, vol. 815, pp. 8-13, 2015
Date:
2015-03-20

Author Information

Name Institution
Chun Min ZhangFudan University
Xiao Yong LiuFudan University
Lin Qing ZhangFudan University
Hong Liang LuFudan University
Peng Fei WangFudan University
David Wei ZhangFudan University

Films

Plasma RuO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Substrates

TiN

Keywords

Interconnect

Notes

528