Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition

Type:
Journal
Info:
J. Mater. Chem. C, 2021, 9, 2919-2932
Date:
2021-01-28

Author Information

Name Institution
Ji LiuTyndall National Institute, University College Cork
Hong Liang LuFudan University
David Wei ZhangFudan University
M. G. NolanTyndall National Institute, University College Cork

Films

Plasma Ru


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: -

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: -

Substrates

Ru(001)
Ru(100)

Notes

1674