Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Bis(cyclopentadienyl)ruthenium, Ruthenocene, Cp2Ru, (C5H5)2Ru, CAS# 1287-13-4

Where to buy

NumberVendorRegionLink
1Gelest🇺🇸Ruthenocene
2Pegasus Chemicals🇬🇧Bis(cyclopentadienyl)ruthenium
3Strem Chemicals, Inc.🇺🇸Bis(cyclopentadienyl)ruthenium, 99% (99.9%-Ru) (Ruthenocene)
4Ereztech🇺🇸Bis(cyclopentadienyl) ruthenium

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
3Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
4Radical Enhanced Atomic Layer Deposition of Metals and Oxides
5Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
6Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics