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Publication Information

Title: Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment

Type: Journal

Info: Vacuum, Volume 140, 2017, Pages 139 - 143

Date: 2016-12-10

DOI: http://dx.doi.org/10.1016/j.vacuum.2016.12.015

Author Information

Name

Institution

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Films

Plasma Pt using Picosun R200

Deposition Temperature Range N/A

75-24-1

94442-22-5

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

XRR, X-Ray Reflectivity

Unknown

Thickness

SEM, Scanning Electron Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Substrates

Silicon

Keywords

Nucleation

Notes

959

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