Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
Type:
Journal
Info:
Vacuum, Volume 140, 2017, Pages 139 - 143
Date:
2016-12-10
Author Information
| Name | Institution |
|---|---|
| Mao-Lin Shi | Fudan University |
| Jing Xu | Fudan University |
| Ya-Wei Dai | Fudan University |
| Qian Cao | Fudan University |
| Lin Chen | Fudan University |
| Qing-Qing Sun | Fudan University |
| Peng Zhou | Fudan University |
| Shi-Jin Ding | Fudan University |
| David Wei Zhang | Fudan University |
Films
Plasma Pt
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Silicon |
Notes
| 959 |