Publication Information

Title:
Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
Type:
Journal
Info:
Vacuum, Volume 140, 2017, Pages 139 - 143
Date:
2016-12-10

Author Information

Name Institution
Mao-Lin ShiFudan University
Jing XuFudan University
Ya-Wei DaiFudan University
Qian CaoFudan University
Lin ChenFudan University
Qing-Qing SunFudan University
Peng ZhouFudan University
Shi-Jin DingFudan University
David Wei ZhangFudan University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Silicon

Keywords

Nucleation

Notes

959