Publication Information

Title:
Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
Type:
Journal
Info:
Nanoscale Research Letters (2017) 12:138
Date:
2017-02-15

Author Information

Name Institution
Shi-Bing QianFudan University
Yong-Ping WangFudan University
Yan ShaoFudan University
Wen-Jun LiuFudan University
Shi-Jin DingFudan University

Films

Plasma Ni


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Al2O3

Keywords

Nucleation

Notes

1019