Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2020, 12 (36), pp 40443-40452
Date:
2020-08-12
Author Information
| Name | Institution |
|---|---|
| Maria Carmen Giordano | École Polytechnique Fédérale de Lausanne (EPFL) |
| Korbinian Baumgaertl | École Polytechnique Fédérale de Lausanne (EPFL) |
| Simon Escobar Steinvall | École Polytechnique Fédérale de Lausanne (EPFL) |
| J. Gay | École Polytechnique Fédérale de Lausanne (EPFL) |
| M. Vuichard | École Polytechnique Fédérale de Lausanne (EPFL) |
| Anna Fontcuberta i Morral | École Polytechnique Fédérale de Lausanne (EPFL) |
| Dirk Grundler | École Polytechnique Fédérale de Lausanne (EPFL) |
Films
Plasma Ni
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Magnetization
Analysis: van der Pauw sheet resistance
Substrates
| Al2O3 |
Notes
| 1507 |