Publication Information

Title:
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2020, 12 (36), pp 40443-40452
Date:
2020-08-12

Author Information

Name Institution
Maria Caterina GiordanoÉcole Polytechnique Fédérale de Lausanne (EPFL)
Korbinian BaumgaertlÉcole Polytechnique Fédérale de Lausanne (EPFL)
Simon Escobar SteinvallÉcole Polytechnique Fédérale de Lausanne (EPFL)
J. GayÉcole Polytechnique Fédérale de Lausanne (EPFL)
M. VuichardÉcole Polytechnique Fédérale de Lausanne (EPFL)
Anna Fontcuberta i MorralÉcole Polytechnique Fédérale de Lausanne (EPFL)
Dirk GrundlerÉcole Polytechnique Fédérale de Lausanne (EPFL)

Films

Plasma Ni


Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Magnetization
Analysis: van der Pauw sheet resistance

Substrates

Al2O3

Keywords

Notes

1507