Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2017, 9 (19), pp 16138-16147
Date:
2017-04-25
Author Information
Name | Institution |
---|---|
Qian Cheng | Arizona State University |
Manpuneet K. Benipal | Arizona State University |
Qianlang Liu | Arizona State University |
Xingye Wang | Arizona State University |
Peter A. Crozier | Arizona State University |
Candace K. Chan | Arizona State University |
Robert J. Nemanich | Arizona State University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Valence Band
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Work Function
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Valence Band Offset
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Photoelectrochemical (PEC) Activity
Characteristic: Photocurrent
Analysis: Linear Sweep Voltammetry
Characteristic: Unknown
Analysis: CA, Chronoamperometry
Substrates
ZnO |
Silicon |
FTO, F:SnO2 |
Notes
1160 |