Publication Information

Title:
Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2017, 9 (19), pp 16138-16147
Date:
2017-04-25

Author Information

Name Institution
Qian ChengArizona State University
Manpuneet K. BenipalArizona State University
Qianlang LiuArizona State University
Xingye WangArizona State University
Peter A. CrozierArizona State University
Candace K. ChanArizona State University
Robert J. NemanichArizona State University

Films

Plasma ZnO


Plasma Al2O3


Plasma SiO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Valence Band
Analysis: UPS, Ultraviolet Photoemission Spectroscopy

Characteristic: Work Function
Analysis: UPS, Ultraviolet Photoemission Spectroscopy

Characteristic: Valence Band Offset
Analysis: UPS, Ultraviolet Photoemission Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Photoelectrochemical (PEC) Activity

Characteristic: Photocurrent
Analysis: Linear Sweep Voltammetry

Characteristic: Unknown
Analysis: CA, Chronoamperometry

Substrates

ZnO
Silicon
FTO, F:SnO2

Keywords

Notes

1160