|1||Strem Chemicals, Inc.||Dimethylaluminum i-propoxide, 98% (99.99+%-Al)|
|2||EpiValence||Aluminium dimethyl isopropoxide|
|3||Alfa Chemistry||Dimethylaluminum i-propoxide|
|4||American Elements||Aluminum Dimethyl Isopropoxide|
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send us an email.
Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms|
|2||Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces|
|3||Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method|
|4||Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide|
|5||Fixed-Gap Tunnel Junction for Reading DNA Nucleotides|
|6||Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment|
|7||Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor|
|8||Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride|
|9||Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects|
© 2014-2018 plasma-ald.com