Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


DMAI, dimethylaluminum isopropoxide, Me2Al(O-i-Pr)3, CAS# 6063-89-4

Where to buy

NumberVendorRegionLink
1American ElementsπŸ‡ΊπŸ‡ΈAluminum Dimethyl Isopropoxide
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈDimethylaluminum i-propoxide, 98% (99.99+%-Al) PURATREM
3GelestπŸ‡ΊπŸ‡ΈDimethylisopropoxyaluminum
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺDimethylaluminum-isopropoxide
5Alfa ChemistryπŸ‡ΊπŸ‡ΈDimethylaluminum i-propoxide
6Pegasus ChemicalsπŸ‡¬πŸ‡§Dimethylaluminiumisopropoxide
7EreztechπŸ‡ΊπŸ‡ΈAluminum Dimethyl Isopropoxide

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
2Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
3Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(ΞΌ-OiPr)]2, as an alternative aluminum precursor
4Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
5Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
6Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
7Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
8Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
9Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
10Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
11Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
12Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride