DMAI, dimethylaluminum isopropoxide, Me2Al(O-i-Pr)3, CAS# 6063-89-4

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈDimethylaluminum i-propoxide, 98% (99.99+%-Al) PURATREM
2Pegasus ChemicalsπŸ‡¬πŸ‡§Dimethylaluminiumisopropoxide
3EreztechπŸ‡ΊπŸ‡ΈAluminum Dimethyl Isopropoxide
4American ElementsπŸ‡ΊπŸ‡ΈAluminum Dimethyl Isopropoxide
5GelestπŸ‡ΊπŸ‡ΈDimethylisopropoxyaluminum
6Alfa ChemistryπŸ‡ΊπŸ‡ΈDimethylaluminum i-propoxide
7DOCK/CHEMICALSπŸ‡©πŸ‡ͺDimethylaluminum-isopropoxide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
2Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
3Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
4Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
5Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
6Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
7Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
8Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(ΞΌ-OiPr)]2, as an alternative aluminum precursor
9Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
10Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
11Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms