DMAI, Me2AlOiPr, DiMethylAluminum Isopropoxide, CAS# 6063-89-4

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
2Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
3Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
4Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
5Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
6Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
7Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
8Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
9Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
10Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects