|1||Strem Chemicals, Inc.||Dimethylaluminum i-propoxide, 98% (99.99+%-Al)|
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Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms|
|2||Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces|
|3||Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method|
|4||Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide|
|5||Fixed-Gap Tunnel Junction for Reading DNA Nucleotides|
|6||Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment|
|7||Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor|
|8||Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride|
|9||Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects|
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