DMAI, Me2AlOiPr, DiMethylAluminum Isopropoxide, CAS# 6063-89-4

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1EreztechAluminum Dimethyl Isopropoxide

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
2Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
3Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
4Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
5Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
6Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
7Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
8Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
9Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
10Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects