DMAI, dimethylaluminum isopropoxide, Me2Al(O-i-Pr)3, CAS# 6063-89-4

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈDimethylisopropoxyaluminum
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈDimethylaluminum i-propoxide, 98% (99.99+%-Al) PURATREM
3EreztechπŸ‡ΊπŸ‡ΈAluminum Dimethyl Isopropoxide
4Pegasus ChemicalsπŸ‡¬πŸ‡§Dimethylaluminiumisopropoxide
5Alfa ChemistryπŸ‡ΊπŸ‡ΈDimethylaluminum i-propoxide
6EpiValenceπŸ‡¬πŸ‡§Aluminium dimethyl isopropoxide
7DOCK/CHEMICALSπŸ‡©πŸ‡ͺDimethylaluminum-isopropoxide
8American ElementsπŸ‡ΊπŸ‡ΈAluminum Dimethyl Isopropoxide

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
2Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
3Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
4Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
5Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
6Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
7Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
8Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
9Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
10Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
11Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(ΞΌ-OiPr)]2, as an alternative aluminum precursor