Publication Information

Title:
Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A137 (2012)
Date:
2011-10-31

Author Information

Name Institution
E. Steven BrandtEastman Kodak Company
Jeremy M. GraceEastman Kodak Company

Films

Other Al2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Polystyrene
Polypropylene
Polyvinylalcohol
PEN, Polyethylene Napthalate

Keywords

Substrate Plasma Pretreatment

Notes

Prepped polymer surfaces with H2O plasma prior to thermal ALD process.
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