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Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
Type:
Conference Proceedings
Info:
2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC)
Date:
2018-06-10
Author Information
| Name | Institution |
|---|---|
| Chang-Yeh Lee | University of New South Wales |
| Xin Cui | University of New South Wales |
| Tian Zhang | University of New South Wales |
| Rong Deng | University of New South Wales |
| Kyung Kim | University of New South Wales |
| Bram Hoex | University of New South Wales |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Interface Trap Density
Analysis: Non-contact Corona C-V
Characteristic: Fixed Charge Density
Analysis: Non-contact Corona C-V
Characteristic: Interfacial Layer
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Current Density
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay
Characteristic: Minority Carrier Lifetime
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay
Substrates
| Si with native oxide |
Notes
| 1420 |