Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Fixed-Gap Tunnel Junction for Reading DNA Nucleotides

Type:
Journal
Info:
ACS Nano, 2014, 8 (12), pp 11994-12003
Date:
2014-11-07
DOI:
http://dx.doi.org/10.1021/nn505356g

Author Information

Name Institution
Pei PangArizona State University

Films

Plasma Al2O3

Hardware used: Custom
DMAI, dimethylaluminum isopropoxide, Me2Al(O-i-Pr)3
CAS#: 6063-89-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 25-220C

Film/Plasma Properties

Substrates

Notes

211