Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(2), Mar/Apr 2014, 021514
Date:
2014-02-10
Author Information
| Name | Institution |
|---|---|
| Jialing Yang | Arizona State University |
| Brianna S. Eller | Arizona State University |
| Manpuneet Kaur | Arizona State University |
| Robert J. Nemanich | Arizona State University |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Band Gap
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Electron Affinitiy
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
| Si(100) |
Notes
| Refs 3 and 33 discuss hardware specifics |
| 13 |