3D structure evolution using metastable atomic layer deposition based on planar silver templates

Type:
Journal
Info:
Applied Surface Science 514 (2020) 145770
Date:
2020-02-13
DOI:
https://doi.org/10.1016/j.apsusc.2020.145770

Author Information

Name Institution
Mario ZieglerLeibniz Institute of Photonic Technology
Sophie ThammLeibniz Institute of Photonic Technology
H. Lisa K.S. StolleLeibniz Institute for Solid State and Materials Research
Jan DellithLeibniz Institute for Solid State and Materials Research
Uwe HübnerLeibniz Institute for Solid State and Materials Research
Dong WangIlmenau University of Technology
Peter SchaafIlmenau University of Technology

Films

Plasma SiO2

Hardware used: Unknown
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Thickness
Analysis: Profilometry
Diagnostic: Dektak

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Substrates

Ag

Notes

1524