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Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
Type:
Journal
Info:
Nature Materials volume 16, pages 127-131 (2017)
Date:
2016-11-07
Author Information
| Name | Institution |
|---|---|
| Li Ji | University of Texas at Austin |
| Hsien-Yi Hsu | University of Texas at Austin |
| Xiaohan Li | University of Texas at Austin |
| Kai Huang | University of Texas at Austin |
| Ye Zhang | University of Texas at Austin |
| Jack C. Lee | University of Texas at Austin |
| Allen J. Bard | University of Texas at Austin |
| Edward T. Yu | University of Texas at Austin |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Current Density
Analysis: Linear Sweep Voltammetry
Characteristic: Efficiency
Analysis: IPCE, Incident-Photon-to-Current Conversion Efficiency
Substrates
Notes
| 1154 |