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Search 1556 plasma ALD publications by:
Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
Type:
Journal
Info:
Thin Solid Films 649 (2018) 24 - 29
Date:
2018-01-13
Author Information
Name | Institution |
---|---|
Michael T. Barako | Stanford University |
Timothy S. English | Stanford University |
Shilpi Roy-Panzer | Stanford University |
Thomas W. Kenny | Stanford University |
K. E. Goodson | Stanford University |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Uniformity
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Electrical Isolation
Analysis: Four-point Probe
Substrates
SiO2 |
Pt |
Keywords
Notes
1219 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |