Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides

Type:
Journal
Info:
Anal. Chem. 2012, 84, 10793-10801
Date:
2012-11-26
DOI:
http://dx.doi.org/10.1021/ac302857z

Author Information

Name Institution
Sam EmaminejadStanford University
Mehdi JavanmardStanford University
Robert W. DuttonStanford University
Ronald W. DavisStanford University

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Plasma HfO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMAHf, tetrakis(dimethylamido)hafnium, hafnium dimethylamide, (Me2N)4Hf, also CAS# 19782-68-4
CAS#: 19962-11-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Au
Cr
Glass

Notes

PDMS bonding step only worked for SiO2, not for Al2O3 or HfO2.
Ultratech Fiji PEALD Al2O3, HfO2, and SiO2 for improved dielectrophoretic force generation.
PEALD SiO2 enabled nanoNewton dielectrophoretic force generation for rapid protein biomarker detection.
164