Publication Information

Title: Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics

Type: Conference Proceedings

Info: 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems

Date: 2013-06-16

DOI: http://dx.doi.org/10.1109/Transducers.2013.6627276

Author Information

Name

Institution

Sam Emaminejad

Stanford University

Mehdi Javanmard

Stanford University

C. Gupta

Stanford University

Robert W. Dutton

Stanford University

Ronald W. Davis

Stanford University

R. T. Howe

Stanford University

Films

Plasma SiO2 using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature = 200C

3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane

15112-89-7

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Au

Cr

Glass

Keywords

Notes

591


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2019 plasma-ald.com