The publication database currently has 1536 entries.
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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
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Publication Information
Title:
Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
Type:
Conference Proceedings
Info:
2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems
Date:
2013-06-16
Author Information
| Name | Institution |
|---|---|
| Sam Emaminejad | Stanford University |
| Mehdi Javanmard | Stanford University |
| C. Gupta | Stanford University |
| Robert W. Dutton | Stanford University |
| Ronald W. Davis | Stanford University |
| R. T. Howe | Stanford University |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Au |
| Cr |
| Glass |
Keywords
Notes
| 591 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |