Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics

Type:
Conference Proceedings
Info:
2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems
Date:
2013-06-16
DOI:
http://dx.doi.org/10.1109/Transducers.2013.6627276

Author Information

Name Institution
Sam EmaminejadStanford University
Mehdi JavanmardStanford University
C. GuptaStanford University
Robert W. DuttonStanford University
Ronald W. DavisStanford University
R. T. HoweStanford University

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Au
Cr
Glass

Notes

591