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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
Type:
Conference Proceedings
Info:
2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems
Date:
2013-06-16
Author Information
| Name | Institution |
|---|---|
| Sam Emaminejad | Stanford University |
| Mehdi Javanmard | Stanford University |
| C. Gupta | Stanford University |
| Robert W. Dutton | Stanford University |
| Ronald W. Davis | Stanford University |
| R. T. Howe | Stanford University |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Au |
| Cr |
| Glass |
Keywords
Notes
| 591 |