Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

Type:
Journal
Info:
Nanotechnology 29 (jul) 405302
Date:
2018-07-26

Author Information

Name Institution
Stefano DallortoLawrence Berkeley National Laboratory
Daniel StaaksLawrence Berkeley National Laboratory
Adam M. SchwartzbergLawrence Berkeley National Laboratory
XiaoMin YangSeagate Technology
Kim Y LeeSeagate Technology
Ivo W RangelowIlmenau University of Technology
Stefano CabriniLawrence Berkeley National Laboratory
Deirdre L. OlynickLawrence Berkeley National Laboratory

Films



Thermal SiO2


Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Nucleation
Analysis: Ellipsometry

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

SiO2
Cr
Carbon

Keywords

Double Patterning

Notes

1578