Publication Information

Title:
Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
Type:
Conference Proceedings
Info:
ECS Trans. 2015 66(5): 269-275
Date:
2015-10-16

Author Information

Name Institution
B. J. HutchinsonTyndall National Institute, University College Cork
V. S. TeodorescuNational Institute of Materials Physics
R. NegreaNational Institute of Materials Physics
B. SheehanTyndall National Institute, University College Cork
Patrick CarolanTyndall National Institute, University College Cork
Shane O'BrienTyndall National Institute, University College Cork
M. ModreanuTyndall National Institute, University College Cork
Martin E. PembleTyndall National Institute, University College Cork
Ian M. PoveyTyndall National Institute, University College Cork

Films


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy

Characteristic: Hysteresis
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Ti

Keywords

Capacitors

Notes

492