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Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
Type:
Conference Proceedings
Info:
ECS Trans. 2015 66(5): 269-275
Date:
2015-10-16
Author Information
| Name | Institution |
|---|---|
| B. J. Hutchinson | Tyndall National Institute, University College Cork |
| V. S. Teodorescu | National Institute of Materials Physics |
| R. Negrea | National Institute of Materials Physics |
| B. Sheehan | Tyndall National Institute, University College Cork |
| Patrick Carolan | Tyndall National Institute, University College Cork |
| Shane O'Brien | Tyndall National Institute, University College Cork |
| M. Modreanu | Tyndall National Institute, University College Cork |
| Martin E. Pemble | Tyndall National Institute, University College Cork |
| Ian M. Povey | Tyndall National Institute, University College Cork |
Films
Plasma HfSiOx
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Characteristic: Hysteresis
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Ti |
Notes
| 492 |