Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (20), pp 13140-13149
Date:
2016-04-20
Author Information
Name | Institution |
---|---|
Peter F. Satterthwaite | Stanford University |
Andrew G. Scheuermann | Stanford University |
Paul K. Hurley | Tyndall National Institute, University College Cork |
Christopher E. D. Chidsey | Stanford University |
Paul C. McIntyre | Stanford University |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
Silicon |
Notes
1157 |