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Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (20), pp 13140-13149
Date:
2016-04-20
Author Information
| Name | Institution |
|---|---|
| Peter F. Satterthwaite | Stanford University |
| Andrew G. Scheuermann | Stanford University |
| Paul K. Hurley | Tyndall National Institute, University College Cork |
| Christopher E. D. Chidsey | Stanford University |
| Paul C. McIntyre | Stanford University |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Silicon |
Notes
| 1157 |