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Publications
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The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors

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Recent Database Additions
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene Electron-enhanced atomic layer deposition of silicon thin films at room temperature Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
Search 1636 plasma ALD publications by:
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics

Paul K. Hurley Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Paul K. Hurley returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
2High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
3Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
4Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks

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