Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors

Type:
Journal
Info:
Journal of Vacuum Science & Technology B 31, 01A107 (2013)
Date:
2012-11-02
DOI:
http://dx.doi.org/10.1116/1.4768681

Author Information

Name Institution
Enrique MirandaUniversitat Autònoma de Barcelona
David JiménezUniversitat Autònoma de Barcelona
Jordi SuñéUniversitat Autònoma de Barcelona
É. O'ConnorTyndall National Institute, University College Cork
Scott MonaghanTyndall National Institute, University College Cork
Ian M. PoveyTyndall National Institute, University College Cork
Karim CherkaouiTyndall National Institute, University College Cork
Paul K. HurleyTyndall National Institute, University College Cork

Films

Thermal HfO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEMAHf, tetrakis(ethylmethylamido) Hafnium, hafnium ethylmethylamide, (EtMeN)4Hf
CAS#: 352535-01-4
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Diagnostic: -

Substrates

SiO2

Notes

658