About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors

Type:
Journal
Info:
Phys. Rev. Lett. 15, 448-456, 2016
Date:
2016-03-14

Author Information

Name Institution
Anshuman CheralaUniversity of Texas at Austin
Meghali ChopraUniversity of Texas at Austin
Bailey YinUniversity of Texas at Austin
Akhila MallavarapuUniversity of Texas at Austin
Shrawan SinghalUniversity of Texas at Austin
Ovadia AbedUniversity of Texas at Austin
Roger BonnecazeUniversity of Texas at Austin
S. V. SreenivasanUniversity of Texas at Austin

Films

Plasma SiO2


Film/Plasma Properties

Substrates

Notes

815