Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors

Type:
Journal
Info:
Phys. Rev. Lett. 15, 448-456, 2016
Date:
2016-03-14

Author Information

Name Institution
Anshuman CheralaUniversity of Texas at Austin
Meghali ChopraUniversity of Texas at Austin
Bailey YinUniversity of Texas at Austin
Akhila MallavarapuUniversity of Texas at Austin
Shrawan SinghalUniversity of Texas at Austin
Ovadia AbedUniversity of Texas at Austin
Roger BonnecazeUniversity of Texas at Austin
S. V. SreenivasanUniversity of Texas at Austin

Films


Film/Plasma Properties

Substrates

Notes

815