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Atomic layer deposition of metal-oxide thin films on cellulose fibers

Type:
Journal
Info:
JOURNAL OF COORDINATION CHEMISTRY 2018, VOL. 71, NO. 11-13, 2043–2052
Date:
2018-05-14
DOI:
http://dx.doi.org/10.1080/00958972.2018.1493201

Author Information

Name Institution
Ortal Lidor-shalevBar Ilan University
Yacov CarmielBar Ilan University
Nikolaos PliatsikasAristotle University of Thessaloniki
Panos PatsalasAristotle University of Thessaloniki
Yitzhak MastaiBar Ilan University

Films

Thermal Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 140C

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Images
Analysis: Optical Microscopy
Diagnostic: Olympus BX51-P

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Helios Nanolab600

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: FEI Helios Nanolab600

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker-Axs D8 Advance diffractometer/reflectometer

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Substrates

Cellulose

Notes

1205