Fan Ren Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fan Ren returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
2Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
3Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
4High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
5Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
6GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
7Band alignment of Al2O3 with (-201) β-Ga2O3
8ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
9Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
10Comparison of passivation layers for AlGaN/GaN high electron mobility transistors