Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Ultrathin Surface Coating Enables the Stable Sodium Metal Anode

Type:
Journal
Info:
Advanced Energy Materials Volume 7, Issue 2, 2017
Date:
2016-08-20
DOI:
http://dx.doi.org/10.1002/aenm.201601526

Author Information

Name Institution
Wei LuoUniversity of Maryland
Chuan-Fu LinUniversity of Maryland
Oliver ZhaoUniversity of Maryland
Malachi NokedBar Ilan University
Ying ZhangUniversity of Maryland
Gary W. RubloffUniversity of Maryland
Liangbing HuUniversity of Maryland

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 75C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Na

Notes

913