Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers

Type:
Journal
Info:
J. Phys. D: Appl. Phys. 46 (2013) 084014
Date:
2013-02-01

Author Information

Name Institution
Anuradha BulusuGeorgia Institute of Technology
Hyungchul (GaTech) KimGeorgia Institute of Technology
David SametGeorgia Institute of Technology
Samuel Graham Jr.Georgia Institute of Technology

Films


Plasma ZnO



Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

Silicon

Notes

Substrates pirahna cleaned.
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