Publication Information

Title: Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers

Type: Journal

Info: J. Phys. D: Appl. Phys. 46 (2013) 084014

Date: 2013-02-01

DOI: http://dx.doi.org/10.1088/0022-3727/46/8/084014

Author Information

Name

Institution

Georgia Institute of Technology

Georgia Institute of Technology

Georgia Institute of Technology

Georgia Institute of Technology

Films

Deposition Temperature Range N/A

75-24-1

7782-44-7

Deposition Temperature Range N/A

557-20-0

7782-44-7

Deposition Temperature Range N/A

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco AFM

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Analytical Axis Ultra DLD

Photoluminescence

PL, PhotoLuminescence

Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Substrates

Silicon

Keywords

Encapsulation

Diffusion Barrier

Notes

Substrates pirahna cleaned.

135



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