Publication Information

Title:
Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
Type:
Journal
Info:
J. Phys. D: Appl. Phys. 46 (2013) 084014
Date:
2013-02-01

Author Information

Name Institution
Anuradha BulusuGeorgia Institute of Technology
Hyungchul (GaTech) KimGeorgia Institute of Technology
David SametGeorgia Institute of Technology
Samuel Graham Jr.Georgia Institute of Technology

Films

Plasma Al2O3


Plasma ZnO



Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

Silicon

Keywords

Encapsulation
Diffusion Barrier

Notes

Substrates pirahna cleaned.
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