Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
Type:
Journal
Info:
Acta Materialia 117 (2016) 153 - 159
Date:
2016-07-06
Author Information
Name | Institution |
---|---|
Yongmin Kim | Stanford University |
Peter Schindler | Stanford University |
Anup L. Dadlani | Stanford University |
Shinjita Acharya | Stanford University |
J Provine | Stanford University |
Jihwan An | Stanford University |
Fritz B. Prinz | Stanford University |
Films
Plasma ZrTiN
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Notes
961 |