Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Where to buy Bis(n-propyl tetramethyl cyclopentadienyl) barium, Ba[(n-Pr)(Me)4Cp]2 CAS# 210758-43-3

Bis(n-propyl tetramethyl cyclopentadienyl) barium, Ba[(n-Pr)(Me)4Cp]2 CAS# 210758-43-3 is available from the following source(s):

NumberVendorRegionLink
1Ereztech🇺🇸Bis(n-propyltetramethylcyclopentadienyl) barium
2Strem Chemicals, Inc.🇺🇸Bis(n-propyltetramethylcyclopentadienyl)barium, min. 98%

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