Search 1553 plasma ALD publications by:
Search 1553 plasma ALD publications by:
Publication Information
Title:
Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
Type:
Journal
Info:
IEEE ELECTRON DEVICE LETTERS, VOL. 34, NO. 9, PP. 1115-1117, 2013
Date:
2013-08-06
Author Information
Name | Institution |
---|---|
Andrew D. Koehler | U.S. Naval Research Laboratory |
Neeraj Nepal | U.S. Naval Research Laboratory |
Travis J. Anderson | U.S. Naval Research Laboratory |
Marko J. Tadjer | U.S. Naval Research Laboratory |
Karl D. Hobart | U.S. Naval Research Laboratory |
Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Francis J. Kub | U.S. Naval Research Laboratory |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
AlGaN |
Keywords
Passivation |
Notes
580 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |