Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
Type:
Journal
Info:
ECS Transactions, 85 (13) 83-94 (2018)
Date:
2018-06-01
Author Information
| Name | Institution |
|---|---|
| I. I. Kazadojev | Tyndall National Institute, University College Cork |
| Shane O'Brien | Tyndall National Institute, University College Cork |
| Louise P. Ryan | Tyndall National Institute, University College Cork |
| M. Modreanu | Tyndall National Institute, University College Cork |
| P. Osiceanu | Institute of Physical Chemistry I.G. Murgulescu |
| S. Somacescu | Institute of Physical Chemistry I.G. Murgulescu |
| D. Vernardou | Technological Educational Institute of Crete |
| Martin E. Pemble | Tyndall National Institute, University College Cork |
| Ian M. Povey | Tyndall National Institute, University College Cork |
Films
Plasma VOx
Thermal VOx
Thermal VOx
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry
Characteristic: Charge Capacity
Analysis: Charge/Discharge Cycling
Substrates
| ITO |
Notes
| 1421 |