Publication Information

Title:
Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
Type:
Poster
Info:
ALD 2012 Poster
Date:
2012-06-18
DOI:
No DOI

Author Information

Name Institution
Guo LiuCambridge NanoTech
Eric W. DegunsCambridge NanoTech
Ganesh M. SundaramCambridge NanoTech
Jill S. BeckerCambridge NanoTech

Films



Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

SiO2

Keywords

Notes

127