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Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
Type:
Journal
Info:
Vacuum, Volume 193, 2021, Pages 110533
Date:
2021-08-15
Author Information
| Name | Institution |
|---|---|
| Rashid Dallaev | Brno University of Technology |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Substrates
| LSAT (LaAlO3)0.3(Sr2TaAlO6)0.7 |
| SiC |
| Silicon |
Notes
| 1662 |