Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces

Type:
Journal
Info:
J Micromech Microeng. 2014 March 1; 24(3): 035003
Date:
2014-02-04
DOI:
http://dx.doi.org/10.1088/0960-1317/24/3/035003

Author Information

Name Institution
Xianzong XieUniversity of Utah
Loren RiethUniversity of Utah
Sandeep NegiUniversity of Utah
Rajmohan BhandariBlackrock Microsystems
Ryan CaldwellUniversity of Utah
Rohit SharmaUniversity of Utah
Prashant TathireddyUniversity of Utah
Florian SolzbacherUniversity of Utah

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Substrates

Ir

Notes

1378