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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
Type:
Journal
Info:
J Micromech Microeng. 2014 March 1; 24(3): 035003
Date:
2014-02-04
Author Information
| Name | Institution |
|---|---|
| Xianzong Xie | University of Utah |
| Loren Rieth | University of Utah |
| Sandeep Negi | University of Utah |
| Rajmohan Bhandari | Blackrock Microsystems |
| Ryan Caldwell | University of Utah |
| Rohit Sharma | University of Utah |
| Prashant Tathireddy | University of Utah |
| Florian Solzbacher | University of Utah |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
| Ir |
Keywords
| Encapsulation |
| Medical |
Notes
| 1378 |