Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C

Type:
Journal
Info:
Sci. Technol. Adv. Mater. 15 (2014) 015003
Date:
2013-11-05
DOI:
http://dx.doi.org/10.1088/1468-6996/15/1/015003

Author Information

Name Institution
Farzad Sadeghi-TohidiGeorgia Institute of Technology
David SametGeorgia Institute of Technology
Samuel GrahamGeorgia Institute of Technology
Olivier N PierronGeorgia Institute of Technology

Films

Plasma TiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Silicon
Al2O3

Notes

1384