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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Lithium-Iron (III) Fluoride Battery with Double Surface Protection
Type:
Journal
Info:
Advanced Energy Materials Volume 8, Issue 26, 2018
Date:
2018-06-15
Author Information
| Name | Institution |
|---|---|
| Enbo Zhao | Georgia Institute of Technology |
| Oleg Borodin | U.S. Army Research Laboratory |
| Xiaosi Gao | Georgia Institute of Technology |
| Danni Lei | Georgia Institute of Technology |
| Yiran Xiao | Georgia Institute of Technology |
| Xiaolei Ren | Georgia Institute of Technology |
| Wenbin Fu | Georgia Institute of Technology |
| Alexandre Magasinski | Georgia Institute of Technology |
| Kostiantyn Turcheniuk | Georgia Institute of Technology |
| Gleb Yushin | Georgia Institute of Technology |
Films
Plasma Al2O3
Plasma TiO2
Plasma ZrO2
Film/Plasma Properties
Characteristic: Battery Properties
Analysis: Charge/Discharge Cycling
Substrates
| CNTs, Carbon NanoTubes |
| FeF3 |
Keywords
| Batteries |
Notes
| 1426 |