Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
Type:
Journal
Info:
J. Mater. Chem. A, 2015, 3, 17332-17343
Date:
2015-07-20
Author Information
| Name | Institution |
|---|---|
| Hyungchul (GaTech) Kim | Georgia Institute of Technology |
| Kai-Lin Ou | University of Arizona |
| Xin Wu | University of Arizona |
| Paul F. Ndione | National Renewable Energy Laboratory |
| Joseph J. Berry | National Renewable Energy Laboratory |
| Yannick Lambert | Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN) |
| Thierry Melin | Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN) |
| Neal R. Armstrong | University of Arizona |
| Samuel Graham | Georgia Institute of Technology |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Ideality Factor
Analysis: I-V, Current-Voltage Measurements
Substrates
| ITO |
| Silicon |
Notes
| 496 |