Publication Information

Title: Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films

Type: Conference Proceedings

Info: 2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)

Date: 2016-06-05

DOI: http://dx.doi.org/10.1109/PVSC.2016.7750195

Author Information

Name

Institution

Toyota Technological Institute

Toyota Technological Institute

Toyota Technological Institute

Toyota Technological Institute

Toyota Technological Institute

Films

Deposition Temperature = 200C

75-24-1

114460-02-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Recombination Velocity

Unknown

Unknown

Efficiency

Unknown

Unknown

Interface Trap Density

Unknown

Unknown

Substrates

Silicon

Keywords

Passivation

Notes

939



Shortcuts



© 2014-2019 plasma-ald.com