Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Bis(ethylcyclopentadienyl)magnesium, (EtCp)2Mg CAS# 114460-02-5

Bis(ethylcyclopentadienyl)magnesium, (EtCp)2Mg CAS# 114460-02-5 is available from the following source(s):

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Bis(ethylcyclopentadienyl)magnesium
2Strem Chemicals, Inc.🇺🇸Bis(ethylcyclopentadienyl)magnesium, min. 98%, 12-0510, contained in high-temp 50 ml cylinder (96-1071) for CVD/ALD
3Ereztech🇺🇸Bis(ethylcyclopentadienyl) magnesium
4DOCK/CHEMICALS🇩🇪Bis(ethylcyclopentadienyl)magnesium
5Strem Chemicals, Inc.🇺🇸Bis(ethylcyclopentadienyl)magnesium, min. 98%, 12-0510, contained in 50 ml cylinder (96-1070) for CVD/ALD

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