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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
Type:
Journal
Info:
Electrochimica Acta Volume 125, 2014, Pages 107 - 116
Date:
2014-01-10
Author Information
| Name | Institution |
|---|---|
| S. Galbiati | CEA - Grenoble |
| A. Morin | CEA - Grenoble |
| N. Pauc | CEA - Grenoble |
Films
Plasma Pt
Thermal Al2O3
Film/Plasma Properties
Substrates
| AAO, Anodic Aluminum Oxide |
Keywords
Notes
| 374 |