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Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
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Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
Type:
Journal
Info:
Electrochimica Acta Volume 125, 2014, Pages 107 - 116
Date:
2014-01-10
Author Information
| Name | Institution |
|---|---|
| S. Galbiati | CEA - Grenoble |
| A. Morin | CEA - Grenoble |
| N. Pauc | CEA - Grenoble |
Films
Plasma Pt
Thermal Al2O3
Film/Plasma Properties
Substrates
| AAO, Anodic Aluminum Oxide |
Keywords
Notes
| 374 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |