Sub-nanometer heating depth of atomic layer annealing

Type:
Journal
Info:
Applied Surface Science 525 (2020) 146615
Date:
2020-05-05

Author Information

Name Institution
Wei-Hao LeeNational Taiwan University
Wei-Chung KaoNational Taiwan University
Yu-Tung YinNational Taiwan University
Sheng-Han YiNational Taiwan University
Kuei-Wen HuangNational Taiwan University
Hsin-Chih LinNational Taiwan University
Miin-Jang ChenNational Taiwan University

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Sapphire
Pt
GaN
Si(100)

Keywords

Notes

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