Hsin-Chih Lin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hsin-Chih Lin returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
2Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
3Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
4Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
5Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
6Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
7In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
8Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
9Sub-nanometer heating depth of atomic layer annealing
10Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
11Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure