Hsin-Chih Lin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hsin-Chih Lin returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
2Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
3Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
4Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
5In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
6Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
7Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure


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