Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
Type:
Journal
Info:
Applied Surface Science 387 (2016) 274 - 279
Date:
2016-06-13
Author Information
Name | Institution |
---|---|
Meng-Chen Tsai | National Taiwan University |
Min-Hung Lee | National Taiwan Normal University |
Chin-Lung Kuo | National Taiwan University |
Hsin-Chih Lin | National Taiwan University |
Miin-Jang Chen | National Taiwan University |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: CET, capacitance equivalent thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope
Substrates
Si(100) |
ZrO2 |
ZrON |
Keywords
Notes
865 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |