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Chin-Lung Kuo Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chin-Lung Kuo returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
2Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
3In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics