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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
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Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Type:
Journal
Info:
Surface & Coatings Technology 427 (2021) 127811
Date:
2021-10-09
Author Information
| Name | Institution |
|---|---|
| P. C. Lin | National Taiwan University |
| K. F. Lin | National Taiwan University |
| C. Chiu | National Taiwan University |
| V. I. Semenov | Ufa State Aviation Technical University |
| Hsin-Chih Lin | National Taiwan University |
| Miin-Jang Chen | National Taiwan University |
Films
Thermal ZrO2
Other ZrO2
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 19756-04-8
CAS#: 7732-18-5
CAS#: 7782-44-7
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Corrosion
Analysis: EPMA, Electron Probe Micro Analyzer
Substrates
| Mg-Ca |
Keywords
| Corrosion |
| Diffusion Barrier |
Notes
| 1628 |