Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition

Type:
Journal
Info:
Surface & Coatings Technology 337 (2018) 44 - 52
Date:
2017-12-23
DOI:
https://doi.org/10.1016/j.surfcoat.2017.12.056

Author Information

Name Institution
Karyn L. JarvisAustralian Nuclear Science and Technology Organisation
Peter J. EvansAustralian Nuclear Science and Technology Organisation
Gerry TrianiAustralian Nuclear Science and Technology Organisation

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000X

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Custom
Diagnostic: Custom

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific ESCA LAB 250 XPS Spectrometer

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific ESCA LAB 250 XPS Spectrometer

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instrument D3000

Characteristic: Wetting Angle
Analysis: -
Diagnostic: -

Substrates

PET, Polyethylene Terephthalate
PEN, Polyethylene Napthalate
Silicon

Notes

1395